A combination of the materials science, manufacturing processes, and pioneering research and developments of SiGe and strained-Si have offered an unprecedented high level of performance enhancement at low manufacturing costs. Encompassing all of these areas, Strained-Si Heterostructure Field Effect Devices addresses the research needs associated with the front-end aspects of extending CMOS technology via strain engineering. The book provides the basis to compare existing technologies with the future technological directions of silicon heterostructure CMOS. After an introduction to the material.
ACQUISITION INFORMATION NOTE
Source for Acquisition/Subscription Address
Ingram Content Group
Stock Number
TANDF_191357
OTHER EDITION IN ANOTHER MEDIUM
Title
Strained-Si heterostructure field effect devices.
International Standard Book Number
9780750309936
PARALLEL TITLE PROPER
Parallel Title
Strained silicon heterostructure field effect devices
TOPICAL NAME USED AS SUBJECT
Metal oxide semiconductor field-effect transistors.
Silicon-- Electric properties.
Metal oxide semiconductor field-effect transistors.