عنوان
پدید آورنده
موضوع
رده
TK 7836 .S54 1995
TK
7836
.
S54
1995
کتابخانه
محل استقرار
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
English
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Chemical vapor deposition : thermal and plasma deposition of electronic materials
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
New York
Name of Publisher, Distributor, etc.
Van Nostrand Reinhold
Date of Publication, Distribution, etc.
c1995
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xii, 292 p. : ill. ; 24 cm
GENERAL NOTES
Text of Note
Includes bibliographical references and index
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
S. Sivaram
ORIGINAL VERSION NOTE
Text of Note
1
Text of Note
2
TOPICAL NAME USED AS SUBJECT
Entry Element
، Microelectronics industry
Entry Element
، Chemical vapor deposition
Entry Element
Materials ، Microelectronics
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TK
7836
.
S54
1995
OTHER CLASS NUMBERS
Class number
CA
PERSONAL NAME - PRIMARY RESPONSIBILITY
Entry Element
Sivaram, S.
Relator Code
AU
TI
