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Dusty plasmas : physics, chemistry, and technological impacts in plasma processing
پدید آورنده
edited by Andre Bouchoule
موضوع
، Plasma engineering,Industrial applications( ، Plasma )Ionized gases(,، Dusty plasmas,، Plasma chemistry,، Plasma-enhanced chemical vapor deposition
رده
TA
2020
.
D8
کتابخانه
Library of Institute for Research in Fundamental Sciences
محل استقرار
استان:
Tehran
ـ شهر:
Tehran
تماس با کتابخانه :
22291812
-
021
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Dusty plasmas : physics, chemistry, and technological impacts in plasma processing
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Chichester
Name of Publisher, Distributor, etc.
Wiley
Date of Publication, Distribution, etc.
c1999
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
]ix[, 408 p.: ill., tables.
GENERAL NOTES
Text of Note
Includes bibliographies
Text of Note
ISBN 0471973866
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
edited by Andre Bouchoule
ORIGINAL VERSION NOTE
Text of Note
1
TOPICAL NAME USED AS SUBJECT
Entry Element
، Plasma engineering
Entry Element
Industrial applications( ، Plasma )Ionized gases(
Entry Element
، Dusty plasmas
Entry Element
، Plasma chemistry
Entry Element
، Plasma-enhanced chemical vapor deposition
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TA
2020
.
D8
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
TI
AU Bouchoule, Andre
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