SiGe and Si strained-layer epitaxy for silicon heterostructure devices
General Material Designation
[Electronic Resource]
First Statement of Responsibility
/ edited by John D. Cressler
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Boca Raton
Name of Publisher, Distributor, etc.
: CRC Press/Taylor & Francis,
Date of Publication, Distribution, etc.
, c2008.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
1 v. (various pagings)
Other Physical Details
: ill. ; 26 cm.
GENERAL NOTES
Text of Note
"The material was previously published in Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy, Taylor and Francis, 2005"--T.p. verso.
NOTES PERTAINING TO PUBLICATION, DISTRIBUTION, ETC.