عنوان
پدید آورنده
موضوع
رده
NE2425 .O38 2010
NE2425
.
O38
2010
کتابخانه
محل استقرار
INTERNATIONAL STANDARD BOOK NUMBER
(Number (ISBN
0819475629
(Number (ISBN
1118030028
(Number (ISBN
9780819475626
(Number (ISBN
9781118030028
NATIONAL BIBLIOGRAPHY NUMBER
Number
b701075
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Chemistry and lithography /
General Material Designation
[Book]
First Statement of Responsibility
Uzodinma Okoroanyanwu.
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Hoboken, N.J. :
Name of Publisher, Distributor, etc.
Wiley,
Date of Publication, Distribution, etc.
©2010.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xxix, 861 pages :
Other Physical Details
illustrations ;
Dimensions
26 cm.
SERIES
Series Title
Press monograph ;
Volume Designation
192
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliographical references and index.
CONTENTS NOTE
Text of Note
Part I: Origins, inventions, and the evolution of lithography. 1. Introduction to lithography -- 2. Invention of lithography and photolithography -- 3. Optical and chemical origins of lithography -- 4. Evolution of lithography.
Text of Note
Part II: Lithographic chemicals. 5. Lithographic chemicals -- 6. Negative resists -- 7. Positive resists -- 8. General considerations on the radiation and photochemistry of resists -- 9. Antireflection coatings and reflectivity control.
Text of Note
Part III: The practice of lithography. 10. Stone, plate, and offset lithography -- 11. The semiconductor lithographic process -- 12. Lithographic modeling -- 13. Optical lithography -- 14. X-ray and extreme-ultraviolet lithographies -- 15. Charged particle lithography -- 16. Lithography in integrated circuit device fabrication -- 17. Advanced resist processing and resist resolution limit issues -- Afterword -- Index.
0
0
0
SUMMARY OR ABSTRACT
Text of Note
This book provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology.
TOPICAL NAME USED AS SUBJECT
Chemistry, Technical.
Lithography.
Chemie.
Chemie.
Chemistry, Technical.
Lithographie.
Lithographie.
Lithography.
DEWEY DECIMAL CLASSIFICATION
Number
621
.
3815/31
Edition
22
LIBRARY OF CONGRESS CLASSIFICATION
Class number
NE2425
Book number
.
O38
2010
OTHER CLASS NUMBERS
Class number
VE
6300
System Code
rvk
PERSONAL NAME - PRIMARY RESPONSIBILITY
Okoroanyanwu, Uzodinma.
CORPORATE BODY NAME - ALTERNATIVE RESPONSIBILITY
Society of Photo-optical Instrumentation Engineers.
ORIGINATING SOURCE
Date of Transaction
20201207164732.0
ELECTRONIC LOCATION AND ACCESS
Electronic name
مطالعه متن کتاب [Book]
Y
